본문 바로가기 대메뉴 바로가기

National Nanofab Center

national nanofab center

Nano·Semiconductor Processing

Nano.Semiconductor Processing

Overview of 8-inch Si Substrate Process Service
  • CMOS Process: Unit, module, and integrated process services based on 180nm CMOS technology
  • MEMS Process: Unit, module, and integrated process services for various sensors and μ-OLEDoS
Overview of 8-inch Transparent Substrate Process Service
  • CMOS & MEMS process services based on transparent substrates such as Quartz, glass, LiNbO3
Overview of Other Process Services
  • 6-inch, 4-inch specimen: Process services using Zig
Overview of Expanded and Applied Process Services
  • Support for system semiconductor research and development, product development, and prototype production based on the above basic services
    • For example: MEMS sensors on CMOS ROIC (Read-out IC), Micro displays on CMOS ROIC, Next-generation memory on CMOS ROIC, etc.
Overview of Component, Part, and Equipment Testbed
  • Construction of 8-inch and 12-inch component, part, and equipment testbeds for semiconductor material, part, and equipment development, and provision of test verification and verification services to domestic industry-academic researchers.