National Nanofab Center Ministry of Science and ICT KAIST

Magnetic Optical Trap Atom Chip for Ultra-small Quantum Sensors

This is a process platform that supports the development of a diffraction grating-based atom chip for capturing and cooling atoms using a single light source.

• It is a precise micro-pattern process of silicon for implementing a diffraction grating through DUV-based lithography.
• It is a process that can selectively deposit reflection and dielectric films on the surface of the diffraction grating based on Mix-and-Match lithography using a DUV scanner and I-line exposure equipment.
• It is a dry dicing process that can minimize surface contamination of the magnetic optical trap atom chip through stealth laser dicing.

• Based on the DUV-based silicon micro-pattern process, it is possible to implement a diffraction grating that can be used up to the short wavelength band. (Minimum linewidth: L/S 70nm)
• Various types of large-diameter atom chips can be produced that can control the laser needed for magnetic optical trapping through 1D or 2D diffraction grating design.
• It has high productivity and price competitiveness with a 200mm large-area silicon process, and it is highly reproducible.

• Computing: It plays a key role in creating neutral atom-based Qbuit for quantum computing.
• Defense/Aerospace: It is also applied to quantum sensors for ultra-precise measurement of time, gravity, magnetic field, inertia, etc.
• Communication: It can be used in the development of quantum light sources and high-sensitivity receivers.

The National Nanofab Center has the capability to provide this atom chip process technology for magnetic optical trapping of atoms, and services are possible in the following scope and technology level.

• Support for the development of diffraction grating start products based on 200mm silicon process
• Evaluation of diffraction grating (in preparation)